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Physical Sciences · Engineering

Semiconductor materials and devices
Research Guide

What is Semiconductor materials and devices?

Semiconductor materials and devices is the field encompassing advances in atomic layer deposition (ALD) technology for high-k dielectrics, gate oxides, thin film growth, dielectric breakdown mechanisms, metal gate transistors, interface engineering, and negative bias temperature instability (NBTI) degradation in semiconductor devices.

This field includes 189,511 works with a focus on ALD for nanoelectronics and high-k materials. Key areas cover thin film growth, interface engineering, and NBTI effects on device performance. Growth rate over the past 5 years is not available in the data.

Topic Hierarchy

100%
graph TD D["Physical Sciences"] F["Engineering"] S["Electrical and Electronic Engineering"] T["Semiconductor materials and devices"] D --> F F --> S S --> T style T fill:#DC5238,stroke:#c4452e,stroke-width:2px
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189.5K
Papers
N/A
5yr Growth
2.6M
Total Citations

Research Sub-Topics

Why It Matters

Semiconductor materials and devices enable scaling of CMOS technology below 0.1 μm through high-κ gate dielectrics replacing SiO2, as detailed in 'High-κ gate dielectrics: Current status and materials properties considerations' (2001) by Wilk et al., which identifies key properties for sub-0.1 μm transistors. Atomic layer deposition provides precise thin film control essential for gate oxides and metal gate transistors, per 'Atomic Layer Deposition: An Overview' (2009) by George with 5509 citations. These advances support high-performance applications like silicon nanowire anodes in lithium batteries, shown in 'High-performance lithium battery anodes using silicon nanowires' (2007) by Chan et al., and extend to spintronics for nonvolatile, high-speed electronics in 'Spintronics: A Spin-Based Electronics Vision for the Future' (2001) by Wolf et al.

Reading Guide

Where to Start

'Atomic Layer Deposition: An Overview' (2009) by George, as it provides a foundational explanation of ALD central to high-k dielectrics and thin film growth in semiconductor devices.

Key Papers Explained

'QUANTUM ESPRESSO: a modular and open-source software project for quantum simulations of materials' (2009) by Giannozzi et al. establishes simulation tools extended in 'Advanced capabilities for materials modelling with Quantum ESPRESSO' (2017) by Giannozzi et al. for density-functional perturbation theory. 'High-κ gate dielectrics: Current status and materials properties considerations' (2001) by Wilk et al. identifies material needs addressed by 'Atomic Layer Deposition: An Overview' (2009) by George. 'Band parameters for III–V compound semiconductors and their alloys' (2001) by Vurgaftman et al. supplies data for modeling in these tools.

Paper Timeline

100%
graph LR P0["Improved tetrahedron method for ...
1994 · 7.0K cites"] P1["Spintronics: A Spin-Based Electr...
2001 · 11.2K cites"] P2["Band parameters for III–V compou...
2001 · 7.1K cites"] P3["Spintronics: Fundamentals and ap...
2004 · 10.9K cites"] P4["QUANTUM ESPRESSO: a modular and ...
2009 · 27.9K cites"] P5["A roadmap for graphene
2012 · 9.0K cites"] P6["Advanced capabilities for materi...
2017 · 7.0K cites"] P0 --> P1 P1 --> P2 P2 --> P3 P3 --> P4 P4 --> P5 P5 --> P6 style P4 fill:#DC5238,stroke:#c4452e,stroke-width:2px
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Most-cited paper highlighted in red. Papers ordered chronologically.

Advanced Directions

Recent preprints address 2D transistors with channels below 35 nm, gate stack engineering, and interconnect materials for integrated devices. News highlights 2D RISC-V microprocessors, full-featured 2D flash chips via ATOM2CHIP, and magnetic semiconductors from UCLA and ShanghaiTech.

Papers at a Glance

# Paper Year Venue Citations Open Access
1 QUANTUM ESPRESSO: a modular and open-source software project f... 2009 Journal of Physics Con... 27.9K
2 Spintronics: A Spin-Based Electronics Vision for the Future 2001 Science 11.2K
3 Spintronics: Fundamentals and applications 2004 Reviews of Modern Physics 10.9K
4 A roadmap for graphene 2012 Nature 9.0K
5 Band parameters for III–V compound semiconductors and their al... 2001 Journal of Applied Phy... 7.1K
6 Improved tetrahedron method for Brillouin-zone integrations 1994 Physical review. B, Co... 7.0K
7 Advanced capabilities for materials modelling with Quantum ESP... 2017 Journal of Physics Con... 7.0K
8 High-performance lithium battery anodes using silicon nanowires 2007 Nature Nanotechnology 6.5K
9 High-κ gate dielectrics: Current status and materials properti... 2001 Journal of Applied Phy... 5.8K
10 Atomic Layer Deposition: An Overview 2009 Chemical Reviews 5.5K

In the News

Code & Tools

Recent Preprints

Latest Developments

Recent developments in semiconductor materials and devices research as of February 2026 include advancements in high-κ dielectric integration on 2D semiconductors for 3D logic systems (Nature Communications), emerging materials such as gallium nitride, silicon carbide, and graphene for power electronics and high-frequency applications (Applied Physics USA), and the continued push toward smaller nodes like 2 nm and Angstrom-class process nodes driven by industry trends (StartUs Insights, ST Blog). Additionally, research into novel 2D materials and heterostructures, such as a two-dimensional material-based one instruction set computer (Nature) and RISC-V microprocessors based on 2D semiconductors (Nature), highlights ongoing innovation in device architecture and materials integration.

Frequently Asked Questions

What is atomic layer deposition in semiconductor devices?

Atomic layer deposition (ALD) is a vapor-phase technique that produces conformal thin films through sequential, self-limiting surface reactions. 'Atomic Layer Deposition: An Overview' (2009) by George describes its use for high-k dielectrics and gate oxides. It enables precise control at the atomic scale for nanoelectronics applications.

How do high-k dielectrics improve semiconductor devices?

High-k dielectrics replace SiO2 in gate stacks to reduce leakage currents while maintaining capacitance in sub-0.1 μm CMOS devices. 'High-κ gate dielectrics: Current status and materials properties considerations' (2001) by Wilk et al. outlines materials properties for this purpose. They address scaling limits in metal gate transistors.

What are band parameters for III-V semiconductors?

Band parameters for III-V compound semiconductors include data for GaAs, GaN, InP, and their alloys in zinc blende and wurtzite structures. 'Band parameters for III–V compound semiconductors and their alloys' (2001) by Vurgaftman et al. compiles these values from experimental and theoretical sources. The parameters support device modeling and simulations.

What is spintronics in semiconductors?

Spintronics uses the spin degree of freedom of electrons for electronics, offering nonvolatility and higher speeds than charge-based devices. 'Spintronics: Fundamentals and applications' (2004) by Žutić et al. reviews spin manipulation in solid-state systems. It builds on foundational work in 'Spintronics: A Spin-Based Electronics Vision for the Future' (2001) by Wolf et al.

What tools simulate semiconductor devices?

ViennaEMC uses multi-valley ensemble Monte Carlo for semiconductor device simulation. DEVSIM applies finite volume methods for TCAD modeling. Excimontec models optoelectronic processes in organic semiconductors via kinetic Monte Carlo.

What is Quantum ESPRESSO used for in this field?

Quantum ESPRESSO is an open-source suite for quantum simulations of materials using density-functional theory and plane waves. 'QUANTUM ESPRESSO: a modular and open-source software project for quantum simulations of materials' (2009) by Giannozzi et al. details its capabilities for electronic-structure calculations. Its advanced version appears in 'Advanced capabilities for materials modelling with Quantum ESPRESSO' (2017).

Open Research Questions

  • ? How can ALD optimize high-k/metal gate stacks to mitigate NBTI degradation in scaled transistors?
  • ? What interface engineering reduces dielectric breakdown in thin film high-k dielectrics?
  • ? How do spin-orbit interactions affect spin injection and detection in semiconductor spintronic devices?
  • ? Which band parameters most accurately predict performance in III-V alloy transistors?
  • ? What two-dimensional materials enable transistor channels below 35 nm with low leakage?

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